NANO-POLISHING SUBSTRATES FOR OPTICS AND MICROELECTRONICS

Authors

  • Юрий Данилович Филатов V. Bakul Institute for Superhard Materials of the National Academy of Sciences of Ukraine,
  • Владимир Игоревич Сидорко V. Bakul Institute for Superhard Materials of the National Academy of Sciences of Ukraine, Ukraine
  • Оксана Ярославовна Юрчишин National Technical University of Ukraine «Kyiv Polytechnic Institute», Kyiv, Ukraine https://orcid.org/0000-0002-3250-636X

DOI:

https://doi.org/10.20535/2305-9001.2016.76.67243

Keywords:

polished, Single crystals, nanoparticles, colloidal system, roughness

Abstract

As a result of research of polishing single crystal materials it was shown that the polishing flat surfaces of optoelectronic elements of single crystal silicon carbide is advantageously carried out by using a polishing slurry of the powders based on MAX-phase Ti3AlC2 and colloidal nanoparticulate systems, and single crystal sapphire - using suspensions of diamond micron powders of the cubic boron nitride powders and MAX-phase Ti3AlC2. Nano-polishing surfaces of elements of single crystal sapphire should be performed using colloidal nanoparticulate systems or traditional formulations based on colloidal silica. It is also shown that the polishing efficiency of single crystal silicon carbide and sapphire is inversely proportional to the transfer energy, the maximum value of which correspond to a minimum roughness.

Author Biographies

Юрий Данилович Филатов, V. Bakul Institute for Superhard Materials of the National Academy of Sciences of Ukraine

д.т.н.

Владимир Игоревич Сидорко, V. Bakul Institute for Superhard Materials of the National Academy of Sciences of Ukraine

д.т.н.

Оксана Ярославовна Юрчишин, National Technical University of Ukraine «Kyiv Polytechnic Institute», Kyiv

доцент кафедри Конструювання верстатів і машин

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Published

2016-07-01

Issue

Section

Original study