NANO-POLISHING SUBSTRATES FOR OPTICS AND MICROELECTRONICS
Keywords:polished, Single crystals, nanoparticles, colloidal system, roughness
AbstractAs a result of research of polishing single crystal materials it was shown that the polishing flat surfaces of optoelectronic elements of single crystal silicon carbide is advantageously carried out by using a polishing slurry of the powders based on MAX-phase Ti3AlC2 and colloidal nanoparticulate systems, and single crystal sapphire - using suspensions of diamond micron powders of the cubic boron nitride powders and MAX-phase Ti3AlC2. Nano-polishing surfaces of elements of single crystal sapphire should be performed using colloidal nanoparticulate systems or traditional formulations based on colloidal silica. It is also shown that the polishing efficiency of single crystal silicon carbide and sapphire is inversely proportional to the transfer energy, the maximum value of which correspond to a minimum roughness.
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