FORMING OF THE FUNCTIONAL NANOSTRUCTURES ON DIELECTRIC SURFACES BY THERMAL EVAPORATION IN VACUUM
DOI:
https://doi.org/10.20535/2305-9001.2014.70.33398Keywords:
nanostructure, functional coverage, dielectric surface, thermal and vacuum evaporation, atomic-force microscopyAbstract
Purpose. Determination of terms of forming of layer functional nanostructures is by causing on the dielectric surfaces of nanometrical coverages of SiO2, C, TiO2 and forming of its nanostructures by the combined method of thermal and vacuum evaporation; application of method of raster electronic and atomic-force microscopy is for research of remaining inequalities and state of surface of functional nanostructures in the process of its exploitation.
Design/methodology/approach. The feature of the combined method offered in-process is realization of its in one technological loop the "thermal and vacuum besieging is cathode-ray modification of coverage" at the unchanging terms of working environment
(р = 5.10-5 Pa) that eliminates formation of compounds of coverage, at co-operating with the elements of environment on the intermediate stage of forming of nanostructure. Remaining inequalities and state of surfaces of functional nanostructures are investigational the methods of raster electronic and atomic-force microscopy in the process of its exploitation in the conditions of aggressive environments.
Findings. Set terms of forming of layer nanometrical coverages of SiO2, C, TiO2 on dielectric surfaces with further creation on its of nanostructures by the combined method of thermal and vacuum evaporation.
Originality/value. It is shown that forming of functional nanostructures on dielectric surfaces in a vacuum allows thermal evaporation to improve microgeometry of its surfaces, decrease remaining porosity coverages and to provide its hydrophobic, what to promote in 1,5…2 times its wearproofness and on 15…22% - adhesion strength.
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